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ABOUT RTC |
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RADIANT
TECHNOLOGY CORPORATION
Welcome to the World of Radiant
Technology Corporation. RTC’s goal is to provide its
customers and partners, with the highest quality of conveyorized thermal
processing equipment anywhere. To this end, RTC has designed numerous
features into our equipment, many of them patented, to help assure our
client's success in achieving their goals.
RTC equipment is highly responsive to critical temperature settings.
With infrared lamps as the primary heat source, the equipment is literally
heating with the speed of light. RTC's unique and patented gas
management system provides an extremely even distribution and well
regulated flow of gas throughout the process chambers.
RTC has introduced many "firsts" involving the
application of near infrared heating. Among them are: |
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FIRST HIGH TEMPERATURE FURNACE capable of operating at 1000°C with
extremely tight temperature control |
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FIRST THICK FILM FURNACE |
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FIRST CONTROLLED ATMOSPHERE FURNACE capable of <5 PPM Oxygen |
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FIRST HYDROGEN FURNACE |
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PRODUCT OVERVIEW |
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SIGNIFICANT APPLICATIONS FOR INFRARED FURNACES
INCLUDE: |
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PHOTOVOLTAIC/SOLAR CELL MANUFACTURERS |
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who require oven
process temperatures of 950 degrees C for 24 hours a day, seven days a
week operations, at belt speeds up to 120 inches per minute. |
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FLAT PANEL DISPLAY MANUFACTURERS |
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who insist on
excellent temperature uniformity across belt widths up to 58 inches wide
and also demand very low particulates inside the furnace. |
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SEMICONDUCTOR PACKAGING |
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market that requires specialty atmospheres
such as hydrogen, forming gas or nitrogen with extremely low oxygen
content. |
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THICK FILM HYBRID CIRCUIT MANUFACTURERS |
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who require rapid firing
processes without sacrifice in product stability, solder-ability and
bond-ability. Infrared furnaces have the flexibility to produce almost any
profiles that are impossible to achieve with other furnace
technology. |
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SEMICONDUCTOR
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MCM/FPD/ENCAPSULANT/CURING |
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SEMICONDUCTOR
High production with exacting temperature and
atmosphere control. The fastest and most efficient production furnaces
available for high-temperature semiconductor and thick-film processing.
High production yields and through put are
achievable due to the design's quick start-up and change over time,
precise and repeatable temperature profiles up to 1000°C. |
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MCM/FLAT-PANEL-DISPLAY/
ENCAPSULANT/CURING
A key characteristic of these systems (one that is
critical to both the MCM and FPD industries) is extremely low particulates
in the heating chambers. 20
particles per cubic foot of particulates 0.3 microns or larger is
routinely achieved in the D Series, while 10 particles per cubic foot or
less is obtained in the advanced ICO Series "Ultra Clean" Curing
Oven. |
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MICROELECTRONICS |
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PV/SOLAR CELL |
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MICROELECTRONICS
The Chamber construction, gas controls, and exhaust are
designed to control in-process atmosphere by maintaining equilibrium
between input exhaust and leakage. Typical
performance allows furnace induced gaseous contaminants to be held at or
below 150 ppm using either oxidizing or inert atmospheres. |
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PV/ SOLAR CELL
RTC is the World leader in furnaces used by the PV (Photovoltaic) industry
for front and back-side contact firing. A combination of the advantages of
short wavelength infrared heaters and the uniformity and repeatability of
the heating chamber provides PV manufacturers with extremely high
production rates and product yields.
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TECHNOLOGY |
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INFRARED HEATING |
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IR heating, unlike convection heating, provides heat
directly to objects without first heating the surrounding air. IR waves
excite molecules within a substance (thus generating heat) but pass,
generally undisturbed through the surrounding atmosphere. Other substances
such as glass, ceramics and some organic materials are also transparent to
IR waves. Objects suspended in these media can, therefore, be heated
directly by IR waves without directly heating the supporting media. RTC is
currently using two types of infrared heating, near infrared and
medium-range infrared. Near infrared furnaces can reach temperatures up to
1000°C, while mid-range infrared furnaces are able to reach temperatures
up to 1300°C. |
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ULTRAVIOLET HEATING
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The simultaneous placement of UV and Infrared heating
lamps inside the same furnace chamber is a new, patent pending, RTC
technology that will work to temperatures as high as 1000°C. This highly
sophisticated system incorporates separate cooling and electrical systems.
Depending upon installation specifications, the cooling jackets support
either air or water cooling. The special mercury vapor lamps inside
cooling jackets supply the UV radiation. |
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CONVECTION HEATING |
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This unique configuration is supplied to perform heat
transfer through the indirect transmission of heated gas. In this type of
furnace, the heating chamber temperature is maintained by heating the
surrounding air. Convection is regularly used in surface mount reflow
soldering when the components are different sizes. In this configuration, IR lamps are used to heat a metal chamber through which air is circulated.
Currently RTC convection furnaces operate to temperatures as high as 600°C. |
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CONDUCTION HEATING |
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In some applications, conduction heating is more
desirable. RTC furnaces can be configured to run in conduction operations
where the standard IR heating lamps are placed below the conveyor belt
only. A special high-density conveyor belt is cycled through the heating
chamber to block the transmission of the IR radiation and absorb the
transmitted energy. The energy output from the lamps is transferred directly
to the conveyor belt itself. Any product in direct contact with the conveyor
belt will absorb the stored heat energy via conduction. Two additional
conveyor systems are used independently to avoid heat loss that would occur
while the conveyor belt is in the cooling section and any baffle modules. |
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