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SEMICONDUCTOR
OVENS |
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D-SERIES |
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EFC-SERIES |
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RTC
D-SERIES OVENS
The D-Series of infrared convection ovens are designed
for processes requiring close control of both temperature and atmosphere.
Primarily intended for thick film drying, adhesive and epoxy curing,
these ovens can also perform many other lower temperature processes
requiring air and nitrogen operating atmospheres. |
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RTC EFC-SERIES OVENS
Enhanced Forced Convection
reflow soldering system is designed for today's SMD manufacturing
environment which demands, high yields in high volume production, low
operating and maintenance costs, simplified operation with less operator
attention, and greater flexibility with fewer required profiles. |
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SMD-SERIES |
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RTC
SMD-SERIES OVENS
RTC furnaces provide
exceptional forced air environmental control.
Internal positive pressure, baffle gates, and air curtains prevents
the over all process from being influenced by outside disturbances. RTC
systems are equipped for compressed air or nitrogen use. |
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SEMICONDUCTOR
FURNACES |
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AG-SERIES |
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H-SERIES |
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RTC
AG-SERIES FURNACES
Single
and two stage silver-glass die attach profiles, as well as solar-cell and
green tape drying and firing sequences, are supported.
Temperature
up to 1000°C, multistage temperature profiles, rapid removal of volatiles
with multiple intermediate exhausts. |
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RTC
H-SERIES FURNACES
H-Series combines all the
necessary components for hydrogen operation with the normal operation of a
furnace. Special warm up and
cool down procedures are implemented along with methods for preheating the
hydrogen atmosphere as enters into the furnace interior. |
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HT-SERIES |
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LA-SERIES |
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RTC
HT-SERIES FURNACES
The HT-Series furnace operates in mid-range infrared by
combining both infrared and ultra-violet heating elements.
The combination of these two enables the furnace to reach
temperatures of up to 1300°C.. |
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RTC
LA-SERIES FURNACES
An extremely versatile, general-purpose laboratory
furnace used for experimental, prototype, or low-volume processing. Its
flexibility, temperature range, controlled-atmosphere capabilities,
availability of options, and process applications are similar to larger
models. |
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S-SERIES |
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WB-SERIES |
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RTC
S-SERIES FURNACES
The fastest and most efficient
production furnaces available for high-temperature semiconductor and
thick-film processing.
High production yields and through put are achievable due to the
design's quick start-up and change over time, precise and repeatable
temperature profiles up to 1000°C.. |
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RTC
WB-SERIES FURNACES
The Wafer Bump series of continuous conduction ovens
are designed especially for advanced semiconductor wafer bump reflow.
The conduction heating principle provides efficient, rapid and
accurate methods of heating and controlling the temperature of the wafers
during the thermal process steps. |
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TECHNOLOGY |
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INFRARED HEATING |
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IR heating, unlike convection heating, provides heat
directly to objects without first heating the surrounding air. IR waves
excite molecules within a substance (thus generating heat) but pass,
generally undisturbed through the surrounding atmosphere. Other substances
such as glass, ceramics and some organic materials are also transparent to
IR waves. Objects suspended in these media can, therefore, be heated
directly by IR waves without directly heating the supporting media. RTC is
currently using two types of infrared heating, near infrared and
medium-range infrared. Near infrared furnaces can reach temperatures up to
1000°C, while mid-range infrared furnaces are able to reach temperatures
up to 1300°C. |
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ULTRAVIOLET HEATING
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The simultaneous placement of UV and Infrared heating
lamps inside the same furnace chamber is a new, patent pending, RTC
technology that will work to temperatures as high as 1000°C. This highly
sophisticated system incorporates separate cooling and electrical systems.
Depending upon installation specifications, the cooling jackets support
either air or water cooling. The special mercury vapor lamps inside
cooling jackets supply the UV radiation. |
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CONVECTION HEATING |
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This unique configuration is supplied to perform heat
transfer through the indirect transmission of heated gas. In this type of
furnace, the heating chamber temperature is maintained by heating the
surrounding air. Convection is regularly used in surface mount reflow
soldering when the components are different sizes. In this configuration, IR lamps are used to heat a metal chamber through which air is circulated.
Currently RTC convection furnaces operate to temperatures as high as 600°C. |
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CONDUCTION HEATING |
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In some applications, conduction heating is more
desirable. RTC furnaces can be configured to run in conduction operations
where the standard IR heating lamps are placed below the conveyor belt
only. A special high-density conveyor belt is cycled through the heating
chamber to block the transmission of the IR radiation and absorb the
transmitted energy. The energy output from the lamps is transferred directly
to the conveyor belt itself. Any product in direct contact with the conveyor
belt will absorb the stored heat energy via conduction. Two additional
conveyor systems are used independently to avoid heat loss that would occur
while the conveyor belt is in the cooling section and any baffle modules. |
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