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GLEN TECHNOLOGIES INC.

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YES-GLEN G1000 PLASMA CLEANER

The YES-G1000 is a 1000 Watt parallel plate system designed to give uniform plasma over up to four large (16 x 16-inch) sample trays. It has three plasma gas inputs and an inert gas input to enable the chamber contents to be bought back to atmospheric pressure in a controlled environment.
All operating parameters and real-time process readout are in plain English. In the event of an abort situation, diagnostics are also shown in plain English. The system has multiple recipes user selectable from the operator's touchscreen interface.
Options include Mass Flow Control on all three plasma gases so that any two (or three) gases can be accurately mixed. RS 232 interface is standard and the system is CE compliant.

SERVICE AND RELIABILITY

The YES-Glen System is designed with total reliability in mind. In the unlikely event that service is required, both system drawers simply roll out from the main console. Only hard plumbed vacuum fittings must be accessed from the rear of the system.   

FEATURES  

YES-GLEN G1000 Plasma Cleaning System
 YES-Glen G1000

bullet 1000 W parallel plate plasma cleaner
bullet Four (4), 16 x 16 in. shelves
bullet Total capacity = 1024 sq. in.
bullet Full PLC Control
bullet Touchscreen Operator Interface
bullet Self Diagnostic Program
PLASMA SELECTION 
bullet Electron-free for cleaning sensitive, electronic devices prior to wire bonding
bullet Active for etching and surface modification prior to bonding
bullet RIE for the most aggressive modification of material surfaces

    

NOTE: The G1000 with the new temperature control and loop program can ideally be used as a plasma stripper. It takes about 1 hour of continuous plasma to remove 1 micron of resist.

YES-Glen designs and manufactures a line of PLC controlled plasma cleaning equipment for cleaning and surface modification for many industries including Semiconductor, Medical, Biochip, Optical and more.

YES-Glen product lines form one of the most comprehensive product ranges in the industry. Systems are available for applications ranging from small volume R&D through higher volume production quantities. Sample sizes range from flat panels to the smallest semiconductor devices. Each system offers quick interchange between five basic operating modes:  

MILD ANISOTROPIC MODES ISOTROPIC MODES   
bullet Downstream, or electron free mode is used for cleaning sensitive electronic devices prior to wire bonding. Product is on a floating tray outside the plasma generation volume. The plasma passes through a grounded tray to the product, balancing the charged species to limit surface charge buildup.
bullet Active mode is used for etching and surface modification prior to bonding applications. Product is on a grounded tray inside the plasma generation area
bullet for cleaning sensitive electronic components normally associated with the semiconductor industry. 
bullet Active Ion Trap is the most aggressive plasma for reactive processes. Product is on an active tray outside the plasma generation volume. Ion trap plasmas have high ion concentrations at low energy levels. 
bullet Downstream Ion trap is for aggressive, electron free cleaning. Product is on a grounded tray outside the plasma generation volume.

  The parallel plate design ensures uniformity of plasma in all modes.
  All RF, Vacuum and Gas control functions are safety interlocked and the systems will shut down in a sealed mode in the event of any parameter going outside preset limits.

PLASMA GAS FLOW  RIE PLASMA FLOW   

Plasma Gas Flow

RIE Plasma

Click on picture to enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)

Click on picture to enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)

ACTIVE PLASMA  DOWNSTREAM ELECTRON-FREE PLASMA  

Active Plasma

Downstream Electron-free Plasma

Click on picture to enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)

Click on picture to enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)

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Last modified: 2016-08-22