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GLEN TECHNOLOGIES INC.

Glen Home

YES-GLEN 1000P-LMC LOADED MAGAZINE CLEANER

This system is specifically designed for fast, uniform cleaning of lead frames and other carrier borne devices loaded into either single or dual magazines. The design provides horizontal flow of plasma (and plasma gas) through the magazine(s) which assures uniform plasma cleaning of components positioned anywhere within the magazine.
All readouts are in English and, in the event of an abort, diagnostic recommendations are displayed on the system readout.
By changing positions of the slide-in electrodes, the system can be operated in any of the three plasma modes defined in the General Overview section. go out of limit, an audible abort signal and flashing light will announce an abort mode and the system will automatically shut down in a sealed condition. The system will show, in Plain English, the reason for the shut down and suggested remedial action.

SERVICE AND RELIABILITY

The YES- Glen System is designed with total reliability in mind. In the unlikely event that service is required, both system drawers simply roll out from the main console. Only hard plumbed vacuum fittings must be accessed from the rear of the system.   

FEATURES  

YES-Glen 1000P-LME with open door showing - and Lead Frame Cassettes,
 YES-Glen 1000P-LMC

bullet 1000 W plasma cleaner
bullet Cleans multiple lead frames or devices loaded into magazines
bullet Accepts one or two magazines up to 8 in. x 6 in. x 13 in.
bullet All readouts in plain English
bullet Operates in Active, Electron-free or RIE modes
bullet Two plasma gas inputs
bullet Three plasma modes
bullet Parallel plate design to provide uniform plasma throughout
PLASMA SELECTION 
bullet Electron-free for cleaning sensitive. electronic devices prior to wire bonding
bullet Active for etching and surface modification prior to bonding
bullet RIE for the most aggressive modification of material surfaces

    

NOTE: The G1000 with the new temperature control and loop program can ideally be used as a plasma stripper. It takes about 1 hour of continuous plasma to remove 1 micron of resist.

YES-Glen designs and manufactures a line of PLC controlled plasma cleaning equipment for cleaning and surface modification for many industries including Semiconductor, Medical, Biochip, Optical and more.

YES-Glen product lines form one of the most comprehensive product ranges in the industry. Systems are available for applications ranging from small volume R&D through higher volume production quantities. Sample sizes range from flat panels to the smallest semiconductor devices. Each system offers quick interchange between five basic operating modes:  

MILD ANISOTROPIC MODES  ISOTROPIC MODES 
bullet Downstream, or electron free mode is used for cleaning sensitive electronic devices prior to wire bonding. Product is on a floating tray outside the plasma generation volume. The plasma passes through a grounded tray to the product, balancing the charged species to limit surface charge build-up.
bullet Active mode is used for etching and surface modification prior to bonding applications. Product is on a grounded tray inside the plasma generation area
bullet for cleaning sensitive electronic components normally associated with the semiconductor industry. 
bullet Active Ion Trap is the most aggressive plasma for reactive processes. Product is on an active tray outside the plasma generation volume. Ion trap plasmas have high ion concentrations at low energy levels. 
bullet Downstream Ion trap is for aggressive, electron free cleaning. Product is on a grounded tray outside the plasma generation volume.

  The parallel plate design ensures uniformity of plasma in all modes.
  All RF, Vacuum and Gas control functions are safety interlocked and the systems will shut down in a sealed mode in the event of any parameter going outside preset limits.

PLASMA GAS FLOW  RIE PLASMA FLOW   

Plasma Gas Flow

RIE Plasma

Click on picture to enlarge

Click on picture to enlarge

ACTIVE PLASMA  DOWNSTREAM ELECTRON-FREE PLASMA  

Active Plasma

Downstream Electron-free Plasma

Click on picture to enlarge

Click on picture to enlarge

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Last modified: 2016-08-22