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RTP-100 SERIES OVENS

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UNITEMP GMBH.

RTP-100 UNIVERSAL THERMAL PROCESS OVENS  FRONT LOADING 

RTP vacuum process oven for inert gases and single wafer processing for up to 100 mm wafer size. Key features are precise controlled fast ramp-up and ramp- down rates. Space saving multipurpose table top unit with front loading drawer for the following applications:

bullet excellent tool for various semiconductor processes
bullet implementing of new semiconductor processes
bullet prototype research
bullet quality control
bullet Annealing
bullet Rapid Thermal Processes
bullet SiAu, SiAl, SiMo alloying
bullet low k dielectrics
bullet post implanting annealing
bullet other processes on demand
TECHNICAL DATA  

RTP-100 THERMAL PROCESS OVEN - FRONT LOADING

RTP-100 THERMAL PROCESS OVEN - FRONT LOADING

bullet for single wafer up to 100 mm (4") or 100 mm x 100 mm substrate size
bullet easy changeable quartz glass process chamber with cover
bullet with integrated gas in- and outlet
bullet 1 Mass Flow Controller for Nitrogen (5 nlm = norm liter per minute) is default
bullet heated by 18 Infrared lamps (20 kW)
bullet top and bottom heating
bullet vacuum for external pump system (up to 10exp-3 mbar, for up to 10exp-6 mbar: see RTP-100-HV))
bullet SPS controller, SIMATIC
bullet Ethernet interface
bullet 7" Touch panel for easy programming and process controll
bullet max. temperature 1200 C    
bullet temperature control by thermocouple
bullet water cooling required
bullet Electricity: CEE 3x32 A, 230 V, 3 Phase, +N, 20 kW
bullet Cooling: Water cooling required
bullet Dimension: 503 x 525 x 570 mm (W x D x H)
bullet Weight: 70 kg
DATA SHEET  
Get the RTP-100 Datasheet in RTP-100 Terminal Process Oven.
INFORMATION   COMPARISON SHEETS  
  Get the RTP Comparison Sheet Comparison RPT ovens
Get the Customer Specific Ovens UniTemp Customer Special Ovens

The oven will be programmed by a Siemens SPS controller. This allows the storage of 12 programs with saving all temperature profiles and segments. Options and accessories like water cooler, additional flow meters, additional gas lines, additional thermocouple etc. are available on request. This tool is for various applications and customers. The small size allows comfortable loading and unloading of the chamber. The oven can be easily placed on a standard laboratory table.

OPTIONS AND ACCESSORIES 

bullet

RTP-100 Basic unit with 1 MFC for Nitrogen (5 slm)

bullet

RTP-MFC Mass Flow controller (max. 4 in total)

bullet

RTP-GP Graphite Plate susceptor

bullet

RVP Rotary vane pump for vacuum up to 10exp.-3 hPa with oil filter and vacuum sensor

bullet

RTP-PC-100 additional oven chamber for usage with one process controller unit (double pack oven) 100 mm; no simultaneous operation of both chambers possible

bullet

RTP-QC-100 spare quartz chamber

bullet

RTP-TC additional thermocouple to measure on device (plugged in chamber),  (max. 3)

bullet

RTP-VM Vacuum measurement with data logging, for vacuum up to 10exp.-3 hPa

bullet

MP Membrane (Diaphragm) pump up to 10 hPa with manometer

bullet

WC II: Closed loop water cooling system (stand alone)

RTP-100 HIGH VACUUM   FRONT LOADING 

RTP vacuum process oven for inert gases and single wafer processing for up to 100 mm wafer size. Key features are precise controlled fast ramp-up and ramp- down rates. Space saving multipurpose table top unit with front loading drawer for the following applications:

bullet excellent tool for various semiconductor processes
bullet implementing of new semiconductor processes
bullet prototype research
bullet quality control
bullet Annealing
bullet Rapid Thermal Processes
bullet SiAu, SiAl, SiMo alloying
bullet low k dielectrics
bullet post implanting annealing
bullet other processes on demand
TECHNICAL DATA  

RTP-100-HV - FRONT LOADING

RTP-100-HV - FRONT LOADING

bullet for single wafer up to 100 mm (4") or 100 mm x 100 mm substrate size
bullet easy changeable quartz glass process chamber with cover
bullet with integrated gas in- and outlet
bullet 1 Mass Flow Controller for Nitrogen (5 nlm = norm liter per minute) is default
bullet heated by 18 Infrared lamps (20 kW)
bullet top and bottom heating
bullet vacuum up to 10exp-6 hPA (Turbomolecular pump and vacuum measurement included, excl. rough pump)
bullet SPS controller, SIMATIC
bullet Ethernet interface
bullet 7" Touch panel for easy programming and process controll
bullet max. temperature 1200 C    
bullet temperature control by thermocouple
bullet water cooling required
bullet Electricity: CEE 3x32 A, 230 V, 3 Phase, +N, 20 kW
bullet Cooling: Water cooling required
bullet Dimension: 503 x 525 x 570 mm (W x D x H)
bullet Weight: 70 kg
DATA SHEET  
Get the RTP-100-HV Datasheet in RTP-100-HV Terminal Process Oven.
INFORMATION   COMPARISON SHEETS  
  Get the RTP Comparison Sheet Comparison RPT ovens
Get the Customer Specific Ovens UniTemp Customer Special Ovens

The oven will be programmed by a Siemens SPS controller. This allows the storage of 12 programs with saving all temperature profiles and segments. Options and accessories like water cooler, additional flow meters, additional gas lines, additional thermocouple etc. are available on request. This tool is for various applications and customers. The small size allows comfortable loading and unloading of the chamber. The oven can be easily placed on a standard laboratory table.

OPTIONS AND ACCESSORIES 

bullet

RTP-100 Basic unit with 1 MFC for Nitrogen (5 slm)

bullet

RTP-MFC Mass Flow controller (max. 4 in total)

bullet

RTP-GP Graphite Plate susceptor

bullet

RVP Rotary vane pump for vacuum up to 10exp.-3 hPa with oil filter and vacuum sensor

bullet

RTP-PC-100 additional oven chamber for usage with one process controller unit (double pack oven) 100 mm; no simultaneous operation of both chambers possible

bullet

RTP-QC-100 spare quartz chamber

bullet

RTP-TC additional thermocouple to measure on device (plugged in chamber),  (max. 3)

bullet

RTP-VM Vacuum measurement with data logging, for vacuum up to 10exp.-3 hPa

bullet

MP Membrane (Diaphragm) pump up to 10 hPa with manometer

bullet

WC II: Closed loop water cooling system (stand alone)

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Last modified: 2016-08-22