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RTP-150 SERIES OVENS

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UNITEMP GMBH.

RTP-150 UNIVERSAL THERMAL PROCESS OVENS  FRONT LOADING 

RTP vacuum process oven for inert gases and single wafer. Processing for up to 150 mm diameter wafer size or for 156 mm x 156 mm solar wafer. Key features are precise controlled fast ramp-up and ramp- down rates. Space saving multipurpose table top unit with front loading drawer for the following applications:

bullet excellent tool for various semiconductor processes
bullet implementing of new semiconductor processes
bullet prototype research
bullet quality control
bullet Annealing
bullet Rapid Thermal Processes
bullet SiAu, SiAl, SiMo alloying
bullet low k dielectrics
bullet post implanting annealing
bullet other processes on demand
TECHNICAL DATA  

RTP-150 THERMAL PROCESS OVEN - FRONT LOADING

RTP-150 THERMAL PROCESS OVEN - FRONT LOADING

bullet Quartz glass chamber with integrated gas in- and outlet
bullet Heating: with Infrared Lamps, total power: 21 kW
bullet top and bottom heating
bullet Loading system: quartz glass tray in the process chamber
bullet Loading area: up to 156 mm wafer size
bullet Controller: fast PID temperature process controller
bullet 12 programs storable
bullet SPS controller, SIMATIC
bullet 7" Touch Panel for comfortable programming and process control
bullet Vacuum up to 10exp.-3 hPa (for Vacuum up to 10exp.-6 hPa see model RTP-150-HV)
bullet Max. Temperature: 1000 C (higher on request)   
bullet Ramp up rate: free programmable, max. 75 K/sec
bullet Ramp down rate: T= 1000 C up to 400 C max. 200 K/min
bullet T=400 C up to 100 C max. 30 K/min.
bullet Electricity: CEE 3x32 A, 230 V, 3 Phase, +N, 21 kW
bullet Cooling: Water cooling required
bullet Dimensions: 505 x 504 x 550 mm (WxHxD)
bullet Weight: approx. 65 kg
DATA SHEET  
Get the RTP-150 Datasheet in RTP-150 Terminal Process Oven.
INFORMATION   COMPARISON SHEETS  
  Get the RTP Comparison Sheet Comparison RPT ovens
Get the Customer Specific Ovens UniTemp Customer Special Ovens

Options and accessories like water cooler, additional flow meters, additional gas lines, additional thermocouple etc. are available on request. This tool is for various applications and customers. The small size (505 x 504 x 420 mm) allows comfortable loading and unloading of the chamber. The oven can be easily placed on a standard laboratory table..

OPTIONS AND ACCESSORIES 

bullet

RTP-150 Basic unit with 1 MFC for Nitrogen (5 slm)

bullet

RTP-MFC Mass Flow controller (max. 4 in total)

bullet

RTP-GP Graphite Plate susceptor

bullet

RTP-PC-150 additional oven chamber for usage with one process controller unit (double pack oven) 150 mm; no simultaneous operation of both chambers possible

bullet

RTP-QP Quartz plate

bullet

RTP-QC-150 spare quartz chamber for RTP-150

bullet

RTP-TC additional thermocouple to measure on device (plugged in chamber),  (max. 3)

bullet

RTP-VM Vacuum measurement with data logging, for vacuum up to 10exp.-3 hPa

bullet

WC III: Closed loop water cooling system

bullet

MP Membrane (Diaphragm) pump up to 10 hPa with manometer

bullet

RVP Rotary vane pump for vacuum up to 10exp.-3 hPa with oil filter and vacuum sensor

RTP-150 HIGH VACUUM   FRONT LOADING 

RTP vacuum process oven for inert gases and single wafer processing for up to 156 mm solar wafer size. Key features are accurate controlled fast ramp-up and ramp-down rates. Space saving multipurpose table top unit with front loading drawer for the following applications:

bullet excellent tool for various semiconductor processes
bullet implementing of new semiconductor processes
bullet prototype research
bullet quality control
bullet Annealing
bullet Rapid Thermal Processes
bullet SiAu, SiAl, SiMo alloying
bullet low k dielectrics
bullet post implanting annealing
bullet other processes on demand
TECHNICAL DATA  

RTP-150-HV - FRONT LOADING

RTP-150-HV - FRONT LOADING

bullet Process chamber: up to 156 mm wafer size
bullet Quartz glass chamber with integrated gas in- and outlet
bullet Heating: with Infrared Lamps, total power: 21 kW
bullet top and bottom heating
bullet Loading system: quartz glass tray in the process chamber
bullet Loading area: up to 156 mm wafer size
bullet Controller: fast PID temperature process controller
bullet 12 programs storable
bullet SPS controller, SIMATIC
bullet 7" Touch Panel for comfortable programming and process control
bullet Vacuum up to 10exp.-6 hPa (Turbomolecular pump and vacuum measurement included)
bullet Max. Temperature: 1000 C (higher on request)
bullet Ramp up rate: free programmable, max. 75 K/sec
bullet Ramp down rate: T= 1000 C up to 400 C max. 200 K/min
bullet T=400 C up to 100 C max. 30 K/min.
bullet Electricity: CEE 3x32 A, 230 V, 3 Phase
bullet Cooling: Water cooling required
bullet Dimensions: 505 x 504 x 670 mm (WxDxH)
bullet Weight: approx. 70 kg
DATA SHEET  
Get the RTP-150-HV Datasheet in RTP-150-HV Terminal Process Oven.
INFORMATION   COMPARISON SHEETS  
  Get the RTP Comparison Sheet Comparison RPT ovens
Get the Customer Specific Ovens UniTemp Customer Special Ovens

Options and accessories like water cooler, additional flow meters, additional gas lines, additional thermocouple etc. are available on request. This tool is for various applications and customers. The small size (505 x 504 x 670 mm) allows comfortable loading and unloading of the chamber. The oven can be easily placed on a standard laboratory table.

OPTIONS AND ACCESSORIES 

bullet

RTP-150-HV Basic unit with 1 MFC for Nitrogen (5 slm)

bullet

RTP-MFC Mass Flow controller (max. 4 in total)

bullet

RTP-GP Graphite Plate suszeptor

bullet

RTP-PC-150 additional oven chamber for usage with one process controller unit (double pack oven) 150 mm; no simultaneous operation of both chambers possible

bullet

RTP-QC-150 spare quartz chamber

bullet

RTP-QP Quartz plate

bullet

RTP-TC additional thermocouple to measure on device (plugged in chamber),  (max. 3)

bullet

WC III: Closed loop water cooling system

bullet

MP Membrane (Diaphragm) pump up to 10 hPa with manometer

bullet

RVP Rotary vane pump for vacuum up to 10exp.-3 hPa with oil filter and vacuum sensor

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Last modified: 2016-08-22