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Chemical Vapor Deposition

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YIELD Engineering Systems Inc.

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CHEMICAL VAPOR DEPOSISTION 

Chemical Vapor Deposition (CVD) is a process widely used in the semiconductor and biotechnology industries for the deposition of a thin film of various materials in order to achieve surface modification. Whether you need a slick surface for microelectromechanical systems (MEMS) or a sticky surface for semiconductor fabrication, chemical vapor deposition will provide the desired surface modification.
Complete dehydration followed by CVD provides a superior silane/substrate bond that is stable after exposure to atmospheric moisture, extending the time available between process steps.

APPLICATIONS 

bullet Silane coating for MEMS
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Semiconductor surface modification

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Copper capping

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BioMEMS packaging

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Glass slide surface modification

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DNA and oligonucleotide adhesion

Hexamethyldisilizane (HMDS)/wafer bonds will last for weeks with no change to surface adhesion. Chemical usage for the vapor deposition process is typically less than 1% of the amount needed for wet application processes, significantly reducing waste and chemical costs.

More information is available on the YES-1224 product page.

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Last modified: 2016-08-22